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Company history

2017

Time for a change – a progressive company needs a progressive appearance. ceATec is developing which is why a corporate design was created that represents the company’s values.

2016

Turn-key projects and market entry in Thailand, Asia.

2015

Relocation and modernization of a
wet precipitator realization of the 40th press vapor extraction system

2014

Member of POS Industries

2014

Development of the CNEF type wet precipitator in connection with the proven formaldehyde purification system

2013

Re-certification of all ceATec locks according to EN 15089

2012

Founding of a branch in Germany; further large-scale orders for chamber filter systems follow

2011

Market launch of a patented
explosion pressure relief damper with
EU type examination certificate; ATEX test of lock ZRLS2000

Development of a pioneering technology for formaldehyde reduction in press vapor extraction systems in the areas of MDF, chips and OSB.

2010

Construction of a complete pelleting system, several large-scale projects in the aluminum industry.

2009

Expansion of production capacity at Eberschwang branch.

2008 - 2009

Establishment and commissioning of a chamber filter system for dedusting at a secondary metallurgy business in Austria.

2008

Development of a chamber filter system

2007

Company moves into new location

2006 - 2007

Further processing of large-scale orders in North and South America, Russia, Eastern Europe and Japan

2006

Construction starts on new company location in Eberschwang

2005 - 2006

Further large-scale orders for dedusting systems are implemented across the globe

2005

ceATec products certified in accordance with the EU Directive 94/9/EU - ATEX 95

2005

Certified acc. to ISO 9001:2000

2004

Development and realization of a wet dedusting system for press vapor extraction

2003

First large-scale orders for complete dedusting system for chipboard plants in Germany and Slovakia

2002

First larger order for complete dedusting system for an Austrian quarry

2002

Founding of ceATec

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